Simulation of photochemical transformations and photodarkening in photoresist films exposed to pulsed vacuum-ultraviolet radiation

Semiconductors

Volumn 34, Issue 7, 2000, Pages 825-828

  Kaliteevskaya, N A ^a   Seisyan R P ^a  

^a IOFFE INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034215263     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1188082     Document Type: Article

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