Acid diffusion analysis in the chemically amplified CARL resist

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 479-483

  Richter, E ^a,b   Hien, S ^b   Sebald, M ^b  

^a UNIVERSITY OF REGENSBURG   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ACIDS; ACRYLICS; ADDITIVES; DIFFUSION IN LIQUIDS; DYES; MOLECULAR DYNAMICS; PHOTOLYSIS; PHOTOMETRY; REACTION KINETICS; ULTRAVIOLET SPECTROSCOPY;

ACID DIFFUSION ANALYSIS; CHEMICALLY AMPLIFIED RESIST; PH SENSITIVE ORGANIC DYE; POST EXPOSURE BAKE;

PHOTORESISTS;

EID: 0034207373     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00360-9     Document Type: Article

References (11)

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