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Volumn 39, Issue 6 A, 2000, Pages 3349-3354
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Surface morphology improvement of metalorganic chemical vapor deposition Al films by layered deposition of Al and ultrathin TiN
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Author keywords
Al; ALD; DMAH; MOCVD; Surface morphology; TDMAT; TiN
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Indexed keywords
ALUMINUM;
ELECTRIC RESISTANCE;
ELECTROMIGRATION;
LIGHT MEASUREMENT;
LIGHT REFLECTION;
LIGHT SCATTERING;
METALLIC FILMS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MORPHOLOGY;
MULTILAYERS;
TITANIUM NITRIDE;
ULTRATHIN FILMS;
ATOMIC LAYER DEPOSITION (ALD);
ELECTROMIGRATION RESISTANCE;
CERMETS;
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EID: 0034207010
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.39.3349 Document Type: Article |
Times cited : (6)
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References (8)
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