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Volumn 39, Issue 6 A, 2000, Pages 3349-3354

Surface morphology improvement of metalorganic chemical vapor deposition Al films by layered deposition of Al and ultrathin TiN

Author keywords

Al; ALD; DMAH; MOCVD; Surface morphology; TDMAT; TiN

Indexed keywords

ALUMINUM; ELECTRIC RESISTANCE; ELECTROMIGRATION; LIGHT MEASUREMENT; LIGHT REFLECTION; LIGHT SCATTERING; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; MULTILAYERS; TITANIUM NITRIDE; ULTRATHIN FILMS;

EID: 0034207010     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.3349     Document Type: Article
Times cited : (6)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.