Initial stage of adsorption for organic carbons and native oxide growth on Si wafer

Applied Surface Science

Volumn 159, Issue , 2000, Pages 41-44

  Matsuo, Naoto ^a   Kawamoto, Naoya ^a   Aihara, Daisuke ^a   Miyoshi, Tadaki ^a  

^a YAMAGUCHI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL BONDS; GAS ADSORPTION; NEGATIVE IONS; OXIDATION;

COULOMB'S FORCE; FIELD ENHANCED OXIDATION; NATIVE OXIDE GROWTH; POLYETHELPOLYOLE; TOTAL ORGANIC CARBON; ULTRAPURE WATER;

SILICON WAFERS;

EID: 0034206915     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00044-1     Document Type: Article

References (8)

1. Abe H., Kiyosumi F., Yoshioka K., Ino M. IEDM Tech. Dig. 1985;372.
2. Ohmi T., Isagawa T., Kogure M., Imaoka T. J. Electrochem. Soc. 140:1993;804.
3. Matsuo N., Kagawa K., Miyoshi T. J. Appl. Phys. 80:1996;4137.
4. Matsuo N., Miyoshi T. Appl. Surf. Sci. 177:1997;103.
5. Okada C., Kobayashi H., Takahashi I., Ryuta J., Shingyoji T. Jpn. J. Appl. Phys. 32:1993;1031.
6. Matsuo N., Kawamoto N., Miyoshi T. Jpn. J. Appl. Phys. 37:1998;4328.
7. Yasaka T., Takakura M., Miyazaki S., Hirose M. Proc. Mater. Res. Symp. Spring Meet. 222:1991;225.
8. Cabrera N., Mott N.F. Rep. Prog. Phys. 12:1948;163.