Characterization of carbon adsorption to Si(100) surface by thermal desorption spectroscopy and x-ray photoelectron spectroscopy

Journal of Applied Physics

Volumn 80, Issue 7, 1996, Pages 4137-4140

  Matsuo, N ^a   Kagawa, K ^a,b   Miyoshi, T ^a  

^a YAMAGUCHI UNIVERSITY   (Japan)

^b Applied Materials Japan Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342434620     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363286     Document Type: Article

References (6)

1. Y. Hirofuji and N. Matsuo, J. Vac. Sci. Technol. B 5, 10 (1987).
2. E. A. Taft, J. Electrochem. Soc. 135, 1022 (1988).
3. M. Morita, T. Ohmi, E. Hasegawa, M. Kawakami, and M. Ohwada, J. Appl. Phys. 68, 1272 (1990).
4. T. Sunada, T. Yasaka, M. Takakura, T. Sugiyama, S. Miyazaki, and M. Hirose, Extended Abstracts of the International Conference on Solid State Devices and Materials, 1990 (unpublished), pp. 1071-1074.
5. T. Takahagi, A. Ishitani, H. Kuroda, Y. Nagasawa, H. Ito, and S. Wakao, J. Appl. Phys. 68, 2187 (1990).
6. 2 and its Interface, edited by S. Pantelides (Pergamon, New York, 1978), pp. 333-338.