Dielectric properties of homoepitaxial SrTiO3 thin films grown in the step-flow mode

Journal of Electroceramics

Volumn 4, Issue 2, 2000, Pages 365-368

  Lippmaa, M ^a   Nakagawa, N ^a   Kawasaki, M ^a   Ohashi, S ^a   Koinuma, H ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DIELECTRIC FILMS; DOPING (ADDITIVES); EPITAXIAL GROWTH; FILM GROWTH; NIOBIUM; PERMITTIVITY; PULSED LASER APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; TEMPERATURE;

STEP FLOW MODE; STOICHIOMETRIC ABLATION; STRONTIUM TITANATE;

STRONTIUM COMPOUNDS;

EID: 0034206574     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1009931130005     Document Type: Article

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