An Experimental setup to test the MAPPER electron lithography concept

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 279-282

  Kampherbeek, B J ^a   Wieland, M J ^a   Van Zuuk, A ^a   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON OPTICS; IMAGE ENHANCEMENT; MASKS; OPTICAL DESIGN; OPTICAL SYSTEMS; PHOTOCATHODES; SCANNING ELECTRON MICROSCOPY;

ALIGNMENT TOOL; MULTIPLE PIXEL BY PIXEL ENHANCEMENT OF RESOLUTION; SCANNING MECHANISM;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034206375     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00314-2     Document Type: Article

References (5)

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2. 2. Malmberg, O'Keeffe and Sopira, J. Vac. Sci. Technol., Vol 10, No. 6 [1973] 1025
3. 3. J.P. Scott, J. Vac. Sci. Technol., Vol 15. No.3 [1978] 1016
4. 4. R.Ward, A.R.Franklin, L.H. Lewin, P.A. Gould and M.J. Plummer, J. Vac. Sci. Technol. B 4(1), 89(1985)
5. 5. B.J. Kampherbeek, M. Wieland and P. Kruit, J. Vac. Sci. Technol. B, nov/dec 1999