Micromachined silicon grisms: high resolution spectroscopy in the near infrared

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 543-546

  Cianci, E ^a   Foglietti, V ^b   Vitali, F ^a   Lorenzetti, D ^a   Notargiacomo, A ^c   Giovine, E ^d  

^a INAF OSSERVATORIO ASTRONOMICO DI ROMA   (Italy)

^b CNR   (Italy)

^c Polo Nazionale Bioelettronica   (Italy)

^d ROMA TRE UNIVERSITY   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; ETCHING; INFRARED SPECTROSCOPY; MICROELECTRONIC PROCESSING; PRISMS; REFRACTIVE INDEX; SILICA; SILICON WAFERS;

CHEMICAL ETCHING; HIGH RESOLUTION SPECTROSCOPY; MICROMACHINED SILICON GRISM; SILICON GRISMS;

SEMICONDUCTOR DEVICES;

EID: 0034206237     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00374-9     Document Type: Article

References (8)

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8. 8. H. Seidel, L. Csepregi, A. Heuberger, H. Baumgartel, J. Electrochem. Soc., 137 (1990) 3612