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Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 475-478

Highly sensitive positive surface modification resists

(3) Shirai, M a Endo, M a,b Tsunooka, M a

a Osaka Prefecture University (Japan)

b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERIZATION; ESTERS; FREE RADICAL POLYMERIZATION; HEATING; MASKS; ORGANIC POLYMERS; PLASTIC FILMS; PYROLYSIS; SURFACE TREATMENT; THERMOGRAVIMETRIC ANALYSIS;

CYCLOHEXYL P-STYRENESULFONATE; O-ACYLOXIME; SULFONIC ACID; THERMOLYSIS;

PHOTORESISTS;

EID: 0034206094 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(00)00359-2 Document Type: Article

Times cited : (4)

References (10)

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