Electron-beam lithography of V-groove quantum wire devices

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 295-298

  Dwir, B ^a   Utke, I ^a   Kaufman, D ^a   Kapon, E ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONTACTS; ELECTRIC RESISTANCE; ELECTRON TRANSPORT PROPERTIES; MICROELECTRONIC PROCESSING; MULTILAYERS; POLYMETHYL METHACRYLATES; SEMICONDUCTOR GROWTH; SEMICONDUCTOR QUANTUM WIRES; SUBSTRATES;

MULTILAYER RESIST; QUANTUM CONTACT RESISTANCE; QUANTUM WIRE DEVICES;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034205514     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00318-X     Document Type: Article

References (9)

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