Modification of the surface potential of azobenzene-containing langmuir-blodgett films in the near field of a scanning Kelvin microscope tip by irradiation

Langmuir

Volumn 16, Issue 13, 2000, Pages 5515-5518

  Karageorgiev, P ^a   Stiller, B ^b   Prescher, D ^b   Dietzel, B ^b   Schulz, B ^a   Brehmer, L ^a  

^a UNIVERSITY OF POTSDAM   (Germany)

^b Inst Thin Film Technol M   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTROMAGNETIC FIELD EFFECTS; IRRADIATION; LANGMUIR BLODGETT FILMS; MICROSCOPIC EXAMINATION; SURFACE PHENOMENA; SURFACE PROPERTIES; SURFACE TREATMENT;

AZOBENZENE; LIGHT INDUCED LOCAL MODIFICATION; SCANNING KELVIN MICROSCOPE; SURFACE POTENTIAL;

BENZENE;

EID: 0034205250     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la991517v     Document Type: Article

References (40)

1. Rau, H. Photochemistry and Photophysics; Rabek, J. F., Ed.; CRC Press: Boca Raton, FL, 1990; Vol. II, p 119 and references therein.
2. Kumar, G. S. AZO functional Polymers; Technomic: Lancaster, 1992 and references therein.
3. Natansohn, A.; Rochon, P.; Gosselin, J.; Xie, S. Macromolekules 1992, 25, 2268.
4. Kim, D. Y.; Tripathy, S. K.; Li, L.; Kumar, J. Appl. Phys. Lett. 1995, 66 (10), 1166.
5. Meng, X.; Natansohn, A.; Rochon, P.Supramol. Sci. 1996, 3, 207.
6. Aoshima, Y.; Egami, C.; Kawata, Y.; Sugihara, O.; Tsuchimori, M.; Watanabe, O.; Fujimura, H.; Okamoto, N. Opt. Commun. 1999, 165, 177.
7. Hill, R. A.; Dreher, S.; Knoesen, A.; Yankelevich D. R. Appl. Phys. Lett. 1995, 66 (17), 2156.
8. Loucif-Saibi, R.; Nakatani, K.; Delaire, J.; Dumont, M.; Sekkat, Z. Chem. Mater. 1993, 5, 229.
9. Beattie, M. S.; Jackson, C.; Jaycox, G. D. Polymer 1998, 39 (12), 2597.
10. Liu, Z. F.; Morigaki, K.; Enomoto, T.; Hashimoto, K.; Fujishima, A. J. Phys. Chem. 1992, 96, 1875.
11. Menzel, H.; Weichart, B.; Schmidt, A.; Paul, S.; Knoll, W.; Stumpe, J.; Fischer, T. Langmuir 1994, 10, 1926.
12. Stumpe, J.; Fischer, Th.; Menzel, H. Macromolecules 1996, 29, 2831.
13. Menzel, H.; Rüther, M.; Stumpe, J.; Fischer, T. Supramol. Sci. 1998, 5, 49.
14. Maack, J.; Ahuja, R. C.; Möbius, D.; Tachibana, H.; Matsumoto, M. Thin Solid Films 1994, 242, 122.
15. Iwamoto, M.; Ohnishi, K.; Xu, X. Jpn. J. Appl. Phys. 1995, 34, 3814.
16. Actually it is possible to observe changes of the surface potential during isomerization of centrosymmetric or isotropic azobenzene-containing films (e.g., spin coating), but as a rule these changes are lower than those for noncentrosymmetric films and they are attributed to the substrate-film or film-air interface.
17. Kelvin Lord Philos. Mag. 1898, 46, 82.
18. Palau, M. J.; Boonet, J. J. Phys. E: Sci. Instrum. 1988, 21, 674.
19. Stiller, B.; Knochenhauer, G.; Markava, E.; Gustina, D.; Muzikante, I.; Karageorgiev, P.; Brehmer, L. Mater. Sci. Eng., C 1999, 8-9, 385.
20. Yasutake, M.; Aoki, D.; Fujihira, M. Thin Solid Films 1996, 273, 279.
21. Moskovits, M. J. Chem. Phys. 1978, 69 (9), 4159.
22. Sarychev, A. K.; Shalaev, V. M. Physika A 1999, 266, 115.
23. Wessel, J. J. Opt. Soc. Am., B 1985, 2, 1538.
24. Stockmann, M. I. Autometria 1989, 3, 30 (in Russian).
25. Gorbunov, A. A.; Pompe, W. Phys. Status Solidi, A 1994, 145, 333
26. Jersch, J.; Dickmann, K. Appl. Phys. Lett. 1996, 68 (6), 868.
27. Zimerman, G.; Chow, L. Y.; Paik, U. J. J. Am. Chem. Soc. 1958, 80, 3528.
28. Paik, C. S.; Morawetz, H. Macromolecules 1972, 5, 171.
29. Yu, W.; Sung, C. S. P.; Robertson, R. Macromolecules 1988, 21, 355.
30. Grebenkin, S. Yu.; Bol'shakov, B. V. Chem. Phys. 1998, 234, 239
31. Gersten, J.; Nitzan, A. J. Chem. Phys. 1980, 73 (7), 3023.
32. Knobloch, H.; Brunner, H.; Leitner, A.; Aussenegg, F.; Knoll, W. J. Chem. Phys. 1993, 98 (12), 10093.
33. Agranovich, V. M.; Galanin, M. D. Modern Problems in Condensed Matter Sciences, Vol. 3: Electronic excitation energy transfer in condensed matter; North-Holland: Amsterdam, 1982.
34. Galanin, M. D. Sov. Phys. JETP 1955, 1, 317.
35. Drexhage K. H. Progress in Optics; Wolf, T., Ed.; North-Holland: Amsterdam, 1974; Vol. 12, p 163.
36. Yamazaki, I.; Tamai, N.; Yamazaki, T.; Murakami, A.; Mimuro, M.; Fujita, Y. J. Phys. Chem. 1988, 92, 5035.
37. Schrader, S.; Zauls, V.; Dietzel, B.; Flueraru, C.; Prescher, D.; Reiche, J.; Motschmann, H.;Brehmer,L. Mater. Sci. Eng., C 1999, 8-9, 527.
38. The influence of the underlayer thickness on the isomerization kinetics and on the isomerization quantum yield was investigated using the conventional Kelvin method. It was established that the presence of an underlayer consisting of 10 monolayers results in decreasing of isomerization rate constants on about 40% and ascending of the signal amplitude in 2.5 times.
39. Stumpe, J.; Fischer, T.; Rutloh, M. In Europhysics Conference Abstracts; Pick, R. M., Bastian, C., Eds.; European Physical Society: Potsdam, 1999; Vol. 23H, p 145.
40. Shimomura, M.; Ando, R.; Kunitake, T. Ber. Bunsen-Ges. Phys. Chem. 1983, 87, 1134.