Mapping the field-emission tunneling barrier of organic adsorbates on tungsten

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 3, 2000, Pages 1216-1221

  Condon, G R ^a,b   Panitz, J A ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b MIT LINCOLN LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; COPPER COMPOUNDS; DECOMPOSITION; ELECTRON MICROSCOPY; IMAGE ANALYSIS; IMAGE QUALITY; SCANNING TUNNELING MICROSCOPY; TUNGSTEN;

FOWLER-NORDHEIM THEORY; KRAMERS-BRILLOUIN (WKB) APPROXIMATION; PHOTOMETRIC PROBE-HOLE FIELD EMISSION ELECTRON MICROSCOPY (PHOTOFEEM);

FIELD EMISSION CATHODES;

EID: 0034186914     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591364     Document Type: Article

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