Feasibility study of chemical liquid deposition based solid freeform fabrication

Materials and Design

Volumn 21, Issue 2, 2000, Pages 83-92

  He, Zongyan ^a   Zhou, Jack G ^a   Tseng, Ampere A ^b  

^a Drexel University   (United States)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

Chemical vapor deposition; Electroplating; Fractal; Organometallic compounds; Solid freeform fabrication (SFF)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTROPLATING; ORGANOMETALLICS; PARTICLES (PARTICULATE MATTER); SUBSTRATES;

CHEMICAL LIQUID DEPOSITION (CLD); ELECTROCHEMICAL LIQUID DEPOSITION (ECLD);

LAYERED MANUFACTURING;

ELECTROPLATING; FABRICATION; VAPOR DEPOSITION;

EID: 0034175861     PISSN: 02641275     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0261-3069(99)00062-x     Document Type: Article

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