Wide band gap amorphous hydrogenated carbon films grown by plasma enhanced chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 356-360

  Convertino, A ^a   Visconti, P ^b   Cingolani, R ^b  

^a CNR   (Italy)

^b UNIVERSITY OF SALENTO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; ELECTRIC POTENTIAL; ELECTRODES; ENERGY GAP; HYDROGEN; ION BOMBARDMENT; METHANE; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE; TEMPERATURE;

AMORPHOUS HYDROGENATED CARBON FILMS; ION BOMBARDMENT ENERGY; OPTICAL GAP; SELF BIAS VOLTAGE;

AMORPHOUS FILMS;

EID: 0034156440     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582192     Document Type: Article

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