Calculation of the field emission current density from n-Si through injection in N-doped diamond

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 2, 2000, Pages 937-941

  Filip, Valeriu ^a,c   Nicolaescu, Dan ^b   Okuyama, Fumio ^a   Plavitu, Constantin N ^c,d  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c UNIVERSITY OF BUCHAREST   (Romania)

^d HYPERION UNIVERSITY   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; DIAMOND FILMS; DOPING (ADDITIVES); ELECTRIC FIELDS; ELECTRON EMISSION; INTERFACES (MATERIALS); MATHEMATICAL MODELS; NITROGEN; SEMICONDUCTING SILICON; THERMAL EFFECTS;

FIELD ELECTRON EMISSION;

FIELD EMISSION CATHODES;

EID: 0034156225     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591302     Document Type: Article

References (14)

1. K. Okano, S. Koizumi, S. R. P. Silva, and G. A. J. Amaratunga, Nature (London) 381, 140 (1996).
2. R. Matsuda, K. Okano, and B. B. Pate, in Materials Issues in Vacuum Microelectronics, edited by W. Zhu, L. S. Pan, T. E. Felter, and C. Holland (Materials Research Society, Warrendale, PA, 1998), p. 59.
3. R. J. Nemanich, P. K. Baumann, M. J. Benjamin, S. L. English, J. D. Hartman, A. T. Sowers, B. L. Ward, and P. C. Yang, in Materials Issues in Vacuum Microelectronics, edited by W. Zhu, L. S. Pan, T. E. Felter, and C. Holland (Materials Research Society, Warrendale, PA, 1998), p. 35.
4. P. B. Lerner, N. M. Miskovsky, and P. H. Cutler, J. Vac. Sci. Technol. B 16, 900 (1998).
5. P. H. Cutler, N. M. Miskovsky, and P. B. Lerner, Proceeding of the 11th IVMC, Asheville, NC, 19-24 July, 1998, Tech. Dig., p. 1.
6. K. L. Jensen and A. K. Ganguly, J. Vac. Sci. Technol. B 11, 371 (1993).
7. M. W. Geis, J. C. Twichell, and T. M. Lyszczarz, J. Vac. Sci. Technol. B 14, 2060 (1996).
8. J. W. Glesener and A. A. Morish, Appl. Phys. Lett. 69, 785 (1996).
9. J. W. Glesener and A. A. Morish, Thin Solid Films 290-291, 153 (1996).
10. B. K. Ridley, Quantum Processes in Semiconductors, 2nd ed. (Clarendon, Oxford, 1988).
11. K. L. Jensen, J. Appl. Phys. 85, 2667 (1999).
12. J. Robertson, J. Vac. Sci. Technol. B 17, 659 (1999).
13. A. T. Sowers, B. L. Ward, and R. J. Nemanich, in Materials Issues in Vacuum Microelectronics, edited by W. Zhu, L. S. Pan, T. E. Felter, and C. Holland (Materials Research Society, Warrendale, PA, 1998), p. 95.
14. F. N. Mott and J. N. Sneedon, Wave Mechanics and its Applications (Clarendon, Oxford, 1948).