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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 2, 2000, Pages 805-810

Spectroscopic investigations of plasma damage of kapton

(3) Lee, Szetsen a Tien, Yu Chung a Hsu, Chin Fa a

a WINBOND ELECTRONICS CORPORATION (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; EMISSION SPECTROSCOPY; FLUOROCARBONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ETCHING; REACTIVE ION ETCHING; ULTRAVIOLET SPECTROSCOPY;

KAPTON; PLASMA DAMAGE;

POLYIMIDES;

EID: 0034155454 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.591280 Document Type: Article

Times cited : (7)

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