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Journal of Materials Research

Volumn 15, Issue 2, 2000, Pages 458-462

Roughness development in electrodeposited ultrathin cobalt and nickel layers

(2) Renner, Robert F a Liddell, Knona C a

a Washington State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COBALT; ELECTRODEPOSITION; FILM GROWTH; MULTILAYERS; NICKEL; SILICON WAFERS; SURFACE ROUGHNESS; THICKNESS MEASUREMENT;

POTENTIOSTATIC CONTROL;

ULTRATHIN FILMS;

EID: 0034142429 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/JMR.2000.0069 Document Type: Article

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.