Resistance of plasma-deposited a-C : H/fluorocarbon films to anodic breakdown in aqueous electrolytes

Journal of Materials Research

Volumn 12, Issue 8, 1997, Pages 2099-2103

  Srividya, C ^a   Sunkara, M ^b   Babu, S V ^a  

^a Clarkson University   (United States)

^b University of Louisville   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMORPHOUS MATERIALS; ANODIC PROTECTION; CORROSION; CURRENT DENSITY; DEPOSITION; ELECTROLYTES; FLUOROCARBONS; PLASMA APPLICATIONS; SPECTROSCOPIC ANALYSIS; STAINLESS STEEL; SUBSTRATES;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY (EMS); POTENTIOMETRY;

PROTECTIVE COATINGS;

EID: 0031211711     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0281     Document Type: Article

References (19)

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