Thickness measurement of submonolayer native oxide films on silicon wafers

Solid State Technology

Volumn 43, Issue 2, 2000, Pages 87-98

  Li, Fuhe ^a,c   Balazs, Marjorie K ^a,d   Deal, Bruce E ^b,e,f  

^a Balazs Analytical Services   (United States)

^b Stanford University   (United States)

^c ACS   (United States)

^d National Federation of Independent Business   (United States)

^e EE and CS Dept   (United States)

^f SANTA CLARA UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EMISSION SPECTROSCOPY; ETCHING; MONOLAYERS; OXIDES; OXYGEN; PLASMA APPLICATIONS; SEMICONDUCTING FILMS; SEMICONDUCTOR GROWTH; SURFACE CLEANING; THICKNESS MEASUREMENT; ULSI CIRCUITS;

INDUCTIVELY COUPLED PLASMA OPTICAL EMISSION SPECTROSCOPY; OXIDE FILMS; RAPID ACID ETCHING; ULTRAPURE WATER RINSE;

SILICON WAFERS;

EID: 0034140033     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

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