Self-similar growth of a compound layer in thin-film binary diffusion couples

Acta Materialia

Volumn 48, Issue 6, 2000, Pages 1371-1381

  Zhang, Huifang ^a   Wong, Harris ^a  

^a Louisiana State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASYMPTOTIC STABILITY; BOUNDARY CONDITIONS; DIFFUSION IN SOLIDS; FILM GROWTH; HIGH TEMPERATURE PROPERTIES; INTERFACES (MATERIALS); MICROELECTRONIC PROCESSING; MULTILAYERS; NONLINEAR EQUATIONS; ORDINARY DIFFERENTIAL EQUATIONS; PHASE TRANSITIONS; SYNTHESIS (CHEMICAL);

BINARY DIFFUSION COUPLES; BULK DIFFUSION; CONCENTRATION GRADIENT; DIFFUSION EQUATION; ELECTRONIC MATERIALS PROCESSING; INTRINSIC DIFFUSION COEFFICIENTS; NONLINEAR KIRKENDELL EFFECT; SELF SIMILAR GROWTH; SHOOTING METHOD;

THIN FILMS;

EID: 0033904716     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(99)00420-6     Document Type: Article

References (23)

1. Mayer, J. W. and Lau, S. S., Electronic Materials Science: For Integrated Circuits in Si and GaAs. Macmillan, New York, 1990.
2. Tu, K. N., Mayer, J. W. and Feldman, L. C., Electronic Thin Film Science. Macmillan, New York, 1992.
3. Greer, A. L., Appl. Surf. Sci., 1995, 86, 329.
4. Greer, A. L., Mater. Sci. Engng, 1991, A134, 1268.
5. Wohlert, S. and Bormann, R., J. appl. Phys., 1999, 85, 825.
6. Cheng, J. Y. and Chen, L. J., J. appl. Phys., 1991, 69, 2161.
7. Michaelsen, C., Yan, Z. H. and Bormann, R., J. appl. Phys., 1993, 73, 2249.
8. Lin, J. H. and Chen, L. J., J. appl. Phys., 1995, 77, 4425.
9. Shim, J. Y., Kwak, J. S., Chi, E. J., Baik, H. K. and Lee, S. M., Thin Solid Films, 1995, 269, 102.
10. Shim, J. Y., Kwak, J. S. and Baik, H. K., Thin Solid Films, 1996, 288, 309.
11. Munir, Z. A., High Temp. Sci., 1990, 27, 279.
12. Munir, Z. A., Metall. Trans. A, 1992, 23A, 7.
13. Kidson, G. V., J. nucl. Mater., 1961, 3, 21.
14. Wagner, C., Acta metall., 1969, 17, 99.
15. Shatynski, S. R., Hirth, J. P. and Rapp, R. A., Acta metall, 1976, 24, 1071.
16. Williams, D. S., Rapp, R. A. and Hirth, J. P., Metall. Trans. A, 1981, 12A, 639.
17. Heumann, T. and Lohmann, P., Z. Elektrochem., 1955, 59, 849.
18. Shewmon, P. G., Diffusion in Solids. McGraw-Hill, New York, 1963.
19. Crank, J., The Mathematics of Diffusion. Oxford University Press, London, 1975.
20. Crank, J., Free and Moving Boundary Problems. Oxford University Press, New York, 1984.
21. Carslaw, H. S. and Jaeger, J. C., Conduction of Heat in Solids. Oxford University Press, New York, 1986.
22. Zhang, H., Master thesis, Louisiana State University, 2000.
23. Jost, W., Diffusion in Solids, Liquids, Gases. Academic Press, New York, 1960.