Dual-phase-lag diffusion model for predicting thin film growth

Semiconductor Science and Technology

Volumn 15, Issue 3, 2000, Pages 235-241

  Chen, J K ^a   Beraun, J E ^a   Tzou, D Y ^b  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b UNIVERSITY OF MISSOURI   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; FILM GROWTH; MERCURY COMPOUNDS; OXIDATION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR GROWTH; THIN FILMS;

DUAL-PHASE-LAG DIFFUSION MODELS;

SEMICONDUCTING FILMS;

EID: 0033900432     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/15/3/301     Document Type: Article

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