Ion-beam irradiation effects on Ni3N/Si bilayers

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 161, Issue , 2000, Pages 986-991

  Rissanen, L ^a   Dhar, S ^a   Lieb, K P ^a   Engel, K ^a   Wenderoth, M ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; INTERFACES (MATERIALS); ION BEAMS; ION BOMBARDMENT; NICKEL COMPOUNDS; NITROGEN; POSITIVE IONS; SILICON; SILICON NITRIDE; SUBSTRATES; SURFACE ROUGHNESS; XENON;

ION BEAM IRRADIATION EFFECTS; LOW ENERGY IRRADIATION;

THIN FILMS;

EID: 0033898965     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00773-9     Document Type: Article

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