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Volumn 12, Issue 3, 2000, Pages 287-289
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Fabrication of 2×2 crosspoint switches using a sputtered SiO2 intermixing technique
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Author keywords
[No Author keywords available]
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Indexed keywords
INSERTION LOSSES;
SEMICONDUCTING INDIUM PHOSPHIDE;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICE TESTING;
SEMICONDUCTOR QUANTUM WELLS;
SEMICONDUCTOR SWITCHES;
SILICA;
CROSSPOINT SWITCHES;
PHOTONIC INTEGRATED CIRCUITS;
QUANTUM-WELL INTERMIXING;
OPTICAL SWITCHES;
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EID: 0033893692
PISSN: 10411135
EISSN: None
Source Type: Journal
DOI: 10.1109/68.826916 Document Type: Article |
Times cited : (10)
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References (4)
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