Polycrystalline silicon films prepared by improved pulsed rapid thermal annealing

Solar Energy Materials and Solar Cells

Volumn 62, Issue 1, 2000, Pages 143-148

  Zhao, Yuwen ^a   Wang, Wenjing ^a   Yun, Feng ^a   Xu, Ying ^a   Liao, Xianbo ^b   Ma, Zhixun ^b   Yue, Guozhen ^b   Kong, Guanglin ^b  

^a Beijing Solar Energy Research Institute   (China)

^b INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; FILM PREPARATION; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; RAPID THERMAL ANNEALING; X RAY CRYSTALLOGRAPHY;

PULSED RAPID THERMAL ANNEALING (PRTA); SOLID-PHASE CRYSTALLIZATION (SPC);

AMORPHOUS SILICON;

EID: 0033893529     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(99)00145-2     Document Type: Article

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