Effect of oxygen presence in sputtering chamber on magnetization of thin FeCo films

Physica B: Condensed Matter

Volumn 276-278, Issue , 2000, Pages 654-655

  Pusenkov, V M ^a   Moskalev, K ^a   Pleshanov, N ^a   Schebetov, A ^a   Syromyatnikov, V ^a   Ul'Yanov, V ^a   Kobzev, A ^b   Nikonov, O ^b  

^a PETERSBURG NUCLEAR PHYSICS INSTITUTE   (Russian Federation)

^b JOINT INSTITUTE FOR NUCLEAR RESEARCH   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; GLASS; IRON ALLOYS; MAGNETIC DOMAINS; MAGNETIZATION; MAGNETRON SPUTTERING; METALLIC FILMS; NEUTRON REFLECTION; OXYGEN; POLARIZATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

POLARIZED NEUTRON REFLECTOMETRY;

MAGNETIC THIN FILMS;

EID: 0033893229     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(99)01744-5     Document Type: Article

References (2)

1. Sinha S.K., Sirota E.B., Garoff B., Stanley H.B. Phys. Rev. B. 38:1988;2297.
2. Pusenkov V.M., Pleshanov N.K., Syromyatnikov V.G., Ul'yanov V.A., Schebetov A.F. J. Magn. Magn. Mater. 175:1997;237.