Ultra-thin elevated channel poly-Si TFT technology for fully-integrated AMLCD system on glass

IEEE Transactions on Electron Devices

Volumn 47, Issue 3, 2000, Pages 569-575

  Zhang, Shengdong ^a   Zhu, Chunxiang ^a   Sin, Johnny K O ^a   Li, J N ^a   Mok, Philip K T ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

GRAIN BOUNDARIES; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING; ULTRATHIN FILMS;

ULTRATHIN ELEVATED CHANNEL THIN FILM TRANSISTORS (UT-ECTFT);

THIN FILM TRANSISTORS;

EID: 0033892819     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.824731     Document Type: Article

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