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Volumn 176, Issue 1, 2000, Pages 239-243
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Third-order optical nonlinear properties of amorphous Si/SiO2 superlattices fabricated by magnetron sputtering
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
CRYSTALLINE MATERIALS;
ELECTROOPTICAL DEVICES;
MAGNETRON SPUTTERING;
OPTICAL PROPERTIES;
POROUS SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR SUPERLATTICES;
SILICA;
CRYSTALLINE SILICON;
ELECTROCHEMICAL ETCHING;
Z SCAN TECHNIQUE;
NONLINEAR OPTICS;
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EID: 0033892160
PISSN: 00304018
EISSN: None
Source Type: Journal
DOI: 10.1016/S0030-4018(00)00501-0 Document Type: Article |
Times cited : (22)
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References (14)
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