Caesium enhancement effect observed during SIMS ultra shallow depth profile analysis of SiO2 on Si

Applied Surface Science

Volumn 157, Issue 3, 2000, Pages 191-198

  Van Der Heide, P A W ^a  

^a UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CESIUM; SECONDARY ION MASS SPECTROMETRY; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPTH PROFILE ANALYSIS;

SILICON;

EID: 0033889382     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00572-3     Document Type: Article

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