Diffusion redistribution of hydrogen and oxygen in porous silicon films

Journal of Materials Science Letters

Volumn 19, Issue 4, 2000, Pages 287-289

  Dzhafarov, T D ^a,b   Can, B ^a  

^a YILDIZ TECHNICAL UNIVERSITY   (Turkey)

^b INSTITUTE OF PHYSICS   (Azerbaijan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CHEMICAL BONDS; DIFFUSION IN SOLIDS; ETCHING; HYDROGEN; OXYGEN; PHOTOLUMINESCENCE; POROSITY; POROUS SILICON; SEMICONDUCTING SILICON; THERMAL EFFECTS;

ANODIC ETCHING;

SEMICONDUCTING FILMS;

EID: 0033888270     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006746226563     Document Type: Article

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