Classification of etch pits at silicon wafer surface using image-processing instrument

Journal of Crystal Growth

Volumn 210, Issue 1, 2000, Pages 366-369

  Akatsuka, M ^a   Sueoka, K ^a   Yamamoto, T ^a  

^a Sumitomo Metal Industries Limited   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CRYSTAL DEFECTS; CRYSTAL GROWTH FROM MELT; ETCHING; FLOW PATTERNS; IMAGE ANALYSIS;

ETCH PITS;

SILICON WAFERS;

EID: 0033888111     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00712-5     Document Type: Article

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