Atomic structure and chemical bondings of intergranular glassy film in Si3N4-SiO2 ceramics

Key Engineering Materials

Volumn 175, Issue , 2000, Pages 107-118

  Yoshiya, M ^a   Tanaka, I ^a   Adachi, H ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CRYSTAL ATOMIC STRUCTURE; ELECTRON ENERGY LOSS SPECTROSCOPY; GAS ADSORPTION; NITROGEN; OXYGEN; SILICA; SILICON NITRIDE; STRAIN;

ELECTRON ENERGY LOSS NEAR EDGE STRUCTURE (ELNES) SPECTROSCOPY; INTERGRANULAR GLASSY FILM;

CERAMIC MATERIALS;

EID: 0033887996     PISSN: 10139826     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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