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Volumn 160, Issue 3, 2000, Pages 363-371

Formation of buried oxide layers in molybdenum by high-fluence oxygen ion implantation

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; ION BOMBARDMENT; ION IMPLANTATION; MORPHOLOGY; OXIDES; OXYGEN; RADIATION DAMAGE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

EID: 0033886979     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00606-0     Document Type: Article
Times cited : (6)

References (10)
  • 8
    • 85031583578 scopus 로고    scopus 로고
    • Joint Committee on Powder Diffraction Standards (JCPDS)
    • Joint Committee on Powder Diffraction Standards (JCPDS), Powder diffraction file 42-1120, 78-1073.
    • Powder Diffraction File 42-1120 , pp. 78-1073


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.