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Volumn 160, Issue 3, 2000, Pages 363-371
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Formation of buried oxide layers in molybdenum by high-fluence oxygen ion implantation
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS MATERIALS;
ANNEALING;
ION BOMBARDMENT;
ION IMPLANTATION;
MORPHOLOGY;
OXIDES;
OXYGEN;
RADIATION DAMAGE;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY CRYSTALLOGRAPHY;
BURIED OXIDE LAYERS;
MOLYBDENUM OXIDE;
MOLYBDENUM;
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EID: 0033886979
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(99)00606-0 Document Type: Article |
Times cited : (6)
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References (10)
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