Hydrogen sensing properties of SnO2 subjected to surface chemical modification with ethoxysilanes

Sensors and Actuators, B: Chemical

Volumn 62, Issue 3, 2000, Pages 211-219

  Wada, Kenji ^a   Egashira, Makoto ^a,b  

^a National Institute of Technology Sasebo College   (Japan)

^b NAGASAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; CONDENSATION REACTIONS; DEHYDRATION; ELECTRIC RESISTANCE; GRAIN BOUNDARIES; HYDROGEN; METHANE; OXIDATION; SILANES; SURFACE TREATMENT; TEMPERATURE PROGRAMMED DESORPTION; TIN COMPOUNDS;

ETHOXYSILANE; TIN DIOXIDE;

CHEMICAL SENSORS;

EID: 0033882431     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(99)00395-0     Document Type: Article

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