Molecular dynamics simulation of cluster beam Al deposition on Si (1 0 0) substrate

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 160, Issue 3, 2000, Pages 372-376

  Zhang, H ^a   Xia, Z N ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ANNEALING; COMPUTER SIMULATION; DEPOSITION; FILM GROWTH; ION BEAMS; ION BOMBARDMENT; MOLECULAR DYNAMICS; THIN FILMS;

IONIZED CLUSTER BEAMS DEPOSITION;

SILICON WAFERS;

EID: 0033881556     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00614-X     Document Type: Article

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