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Volumn 1, Issue , 1997, Pages 253-256
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Hemispherical-grained LPCVD-polysilicon films in use for MEMs applications
a
a
NEC CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
CHEMICAL VAPOR DEPOSITION;
MICROELECTROMECHANICAL DEVICES;
MORPHOLOGY;
RESIDUAL STRESSES;
STICTION;
HEMISPHERICAL GRAINED (HSG) POLYSILICON;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);
PLASTIC FILMS;
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EID: 0030688643
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (1)
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References (10)
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