PTCDA film formation on Si(111):H-1×1 surface: Total current spectroscopy monitoring

Surface Science

Volumn 446, Issue 3, 2000, Pages 193-198

  Morozov, A O ^a   Kampen, T U ^b   Zahn, D R T ^b  

^a ST PETERSBURG STATE UNIVERSITY   (Russian Federation)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BAND STRUCTURE; CRYSTAL ORIENTATION; ELECTRON REFLECTION; HETEROJUNCTIONS; LOW ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING ORGANIC COMPOUNDS; SEMICONDUCTOR GROWTH; SILICON WAFERS; SPECTROSCOPIC ANALYSIS; THIN FILMS; VACUUM DEPOSITED COATINGS;

PERYLENETETRACARBOXYLIC DIANHYDRIDE; TOTAL CURRENT SPECTROSCOPY (TCS);

SEMICONDUCTING FILMS;

EID: 0033879001     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)01143-7     Document Type: Article

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