Dependence of epitaxial layer defect morphology on substrate particle contamination of Si epitaxial wafer

Journal of the Electrochemical Society

Volumn 147, Issue 3, 2000, Pages 1199-1203

  Iwabuchi, M ^a   Mizushima, K ^a   Mizuno, M ^a   Kitagawara, Y ^a  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; CRYSTAL IMPURITIES; DEPOSITION; EPITAXIAL GROWTH; MORPHOLOGY; PARTICLE SIZE ANALYSIS; STACKING FAULTS; SUBSTRATES;

DEFECT MORPHOLOGY; EPITAXIAL LAYER DEFECT; MICROPROTRUSION; SUBSTRATE PARTICLE CONTAMINATION;

SILICON WAFERS;

EID: 0033873399     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393336     Document Type: Article

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