Comparative Raman spectroscopy study on silicon surface in HF, HF/H2O2 and HF/NH4F aqueous solutions

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 72, Issue 2, 2000, Pages 193-196

  Wang, Jing ^a   Tu, Hailing ^a   Zhu, Wuxin ^a   Zhou, Qigang ^a   Liu, Ansheng ^a   Zhang, Chun ^a  

^a GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; ETCHING; HYDROFLUORIC ACID; MIXTURES; RAMAN SPECTROSCOPY; SOLUTIONS; SURFACES;

BUFFERED HYDROFLUORIC ACIDS; CONFOCAL; DILUTE HYDROFLUORIC ACIDS;

SILICON WAFERS;

EID: 0033873281     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00512-7     Document Type: Article

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