Optical second-harmonic phase spectroscopy of the Si(111)-SiO2 interface

Thin Solid Films

Volumn 364, Issue 1, 2000, Pages 91-94

  Aktsipetrov, O A ^a   Dolgova, T V ^a   Fedyanin, A A ^a   Schuhmacher, D ^b   Marowsky, G ^b  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b LASER LABORATORIUM GÖTTINGEN E V   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; ELECTRON TRANSITIONS; INTERFACES (MATERIALS); PHOTONS; SECOND HARMONIC GENERATION; SEMICONDUCTING SILICON; SILICA; SPECTROSCOPIC ANALYSIS; THIN FILMS;

CRITICAL POINT (CP); QUADRATIC SUSCEPTIBILITY;

SEMICONDUCTING FILMS;

EID: 0033872587     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00909-8     Document Type: Article

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