New observation of band-to-band tunneling induced hot-carrier stress using charge-pumping technique

IEEE Electron Device Letters

Volumn 21, Issue 3, 2000, Pages 123-126

  Chu, Yu Lin ^a   Wu, Ching Yuan ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CHARGE; ELECTRIC CURRENT MEASUREMENT; ELECTRIC FIELDS; ELECTRON TUNNELING; FERMI LEVEL; INTERFACES (MATERIALS); MOSFET DEVICES; NATURAL FREQUENCIES; NONLINEAR EQUATIONS;

BAND TO BAND TUNNELING; CHARGE PUMPING TECHNIQUE; INTERFACE STATES; OXIDE TRAPPED CHARGES;

HOT CARRIERS;

EID: 0033871503     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.823576     Document Type: Article

References (9)

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