Dynamics of ion expulsion in ultrashort pulse laser sputtering of Al2O3

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 682-690

  Stoian, R ^a   Ashkenasi, D ^a   Rosenfeld, A ^a   Wittmann, M ^a   Kelly, R ^b   Campbell, E E B ^c  

^a MAX BORN INSTITUT   (Germany)

^b UNIVERSITY OF TRENTO   (Italy)

^c CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ION BOMBARDMENT; KINETIC ENERGY; LASER ABLATION; LASER APPLICATIONS; LASER PULSES; MASS SPECTROMETRY;

ION EXPULSION; ULTRASHORT PULSE LASER SPUTTERING;

ALUMINA;

EID: 0033747998     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00725-9     Document Type: Article

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