Thermooptic interferometric switches fabricated by electron beam irradiation of silica-on-silicon

Journal of Lightwave Technology

Volumn 16, Issue 5, 1998, Pages 841-846

  Syahriar, Ary ^a,b,c,d   Syms, Richard R A ^a,e,f   Tate, Thomas J ^a,f  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF SUMATERA UTARA   (Indonesia)

^c UNIVERSITY OF WATERLOO   (Canada)

^d Agy Assess and Applic of Technol   (Indonesia)

^e UNIVERSITY OF OXFORD   (United Kingdom)

^f Worcester College ^*  (United Kingdom)

Author keywords

Integrated optics; Optical switching; Optical waveguides; Silica on silicon

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CLADDING (COATING); ELECTRON BEAMS; HIGH TEMPERATURE OPERATIONS; INTEGRATED OPTICS; INTERFEROMETERS; LOW TEMPERATURE OPERATIONS; OPTICAL WAVEGUIDES; PLASMA APPLICATIONS; THERMODYNAMIC STABILITY;

ELECTRON BEAM IRRADIATION; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); THERMOOPTIC INTERFEROMETRIC SWITCHES;

OPTICAL SWITCHES;

EID: 0032070146     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/50.669015     Document Type: Article

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