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Volumn 40, Issue 4-5, 2000, Pages 799-802

Effect of traps in the transition Si/SiO2 layer on input characteristics of SOI transistors

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; ELECTRON TRAPS; SILICON ON INSULATOR TECHNOLOGY; TRANSCONDUCTANCE;

EID: 0033741277     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0026-2714(99)00297-8     Document Type: Article
Times cited : (11)

References (9)
  • 1
    • 0032093427 scopus 로고    scopus 로고
    • Comparison of the freeze-out effect in In and B doped n-MOSFETs in the range 4.2-300 K
    • Alawneh I, Simoen E, Biesemans S, De Meyer K, Claeys C. Comparison of the freeze-out effect in In and B doped n-MOSFETs in the range 4.2-300 K. J de Physique IV 1998;8:3-8.
    • (1998) J de Physique IV , vol.8 , pp. 3-8
    • Alawneh, I.1    Simoen, E.2    Biesemans, S.3    De Meyer, K.4    Claeys, C.5
  • 2
    • 0027575424 scopus 로고
    • Evidence of different conduction mechanisms in accumulation-mode p-channel SOI MOSFETs at room and liquidhelium temperatures
    • Rotondaro ALP, Magnusson UK, Claeys C, Colinge J-P. Evidence of different conduction mechanisms in accumulation-mode p-channel SOI MOSFETs at room and liquidhelium temperatures. IEEE Trans Electron Devices 1993;40:727-32.
    • (1993) IEEE Trans Electron Devices , vol.40 , pp. 727-732
    • Rotondaro, A.L.P.1    Magnusson, U.K.2    Claeys, C.3    Colinge, J.-P.4
  • 3
    • 0025404175 scopus 로고
    • Conduction mechanisms in thin-film accumulation-mode SOI p-channel MOSFETs
    • Colinge J-P. Conduction mechanisms in thin-film accumulation-mode SOI p-channel MOSFETs. IEEE Trans Electron Devices 1990;37:718-23.
    • (1990) IEEE Trans Electron Devices , vol.37 , pp. 718-723
    • Colinge, J.-P.1
  • 7
    • 0026873244 scopus 로고
    • Current stochasticity of field emission of charge from traps in the transition layer of implanted MIS structures
    • Gomeniuk YV, Litovski RN, Lysenko VS, Osiyuk IN, Tyagulski IP. Current stochasticity of field emission of charge from traps in the transition layer of implanted MIS structures. Appl Surf Sci 1992;59:91-4.
    • (1992) Appl Surf Sci , vol.59 , pp. 91-94
    • Gomeniuk, Y.V.1    Litovski, R.N.2    Lysenko, V.S.3    Osiyuk, I.N.4    Tyagulski, I.P.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.