Amorphous carbon: How much of free hydrogen?

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 707-710

  Kapitonov, I N ^a   Konkov, O I ^a   Terukov, E I ^a   Trapeznikova, I N ^a  

^a IOFFE INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; CHEMICAL BONDS; HYDROGEN; PALLADIUM;

GAS EFFUSION;

AMORPHOUS FILMS;

EID: 0033738958     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00239-9     Document Type: Article

References (12)

1. J.C. Angus, F. Jansen, J. Vac. Sci. Technol. A 6 (1988) 1778.
2. B. Dishler, A. Burenzer, P. Koidl, Sol. State Commun. 48 (1983) 105.
3. A. Grill, V. Patel, Appl. Phys. Lett. 60 (1992) 2089.
4. A. Grill, V. Patel, Diamond Films Technol. 1 (1992) 219.
5. J. Ristein, R.T. Stief, L. Ley, J. Appl. Phys. 84 (7) (1998) 3836.
6. O.I. Konkov, E.I. Terukov, I.N. Trapeznikova, Semiconductors 30 (1996) 1138.
7. W. Beyer, in: D. Adler, H. Fritzsche (Eds.), Tetrahedrally-bonded Amorphous Semiconductors, Plenum Press, New York, 1985.
8. I.N. Trapeznikova, O.I. Konkov, E.I. Terukov, S.G. Yastrebov, Phys. Sol. State 36 (1994) 2780.
9. A. Grill, IBM J. Res. Dev. 43 (N 1/2 - Plasma Processing) (1999)
10. J. Robertson, Progr. Solid State Chem. 21 (1992) 199.
11. W. Beyer, H. Wagner, J. Appl. Phys. 53 (1982) 8745.
12. S. Logothetidic, G. Kiriakidis, E.C. Palowra, J. Appl. Phys. 70 (1991) 2791.