Field emission controlled by the substrate/CVD diamond interface

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 1218-1221

  Koenigsfeld, N ^a   Philosoph, B ^a   Kalish, R ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRIC FIELD MEASUREMENT; ELECTRON EMISSION; INTERFACES (MATERIALS); SILICON WAFERS; SURFACE ROUGHNESS;

FOWLER-NORDHEIM INJECTION; NEGATIVE ELECTRON AFFINITY;

DIAMOND FILMS;

EID: 0033737361     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00351-9     Document Type: Article

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