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Volumn 166, Issue , 2000, Pages 788-792

Electron emission devices formed by energetic cluster impacts on TiO2 rutile

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ATOMIC FORCE MICROSCOPY; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRON SPECTROSCOPY; FULLERENES; ION BEAMS; ION BOMBARDMENT; PARTICLE BEAM TRACKING; RADIATION EFFECTS; REFRACTORY MATERIALS; SINGLE CRYSTALS;

EID: 0033736509     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00002-1     Document Type: Article
Times cited : (19)

References (9)
  • 9
    • 85031577471 scopus 로고    scopus 로고
    • Université LYON 1 patent pending, May 1999, No. 9906254
    • Vu Thien Binh, J.P. Dupin, P. Thevenard, Université LYON 1 patent pending, May 1999, No. 9906254.
    • Binh, V.T.1    Dupin, J.P.2    Thevenard, P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.