Continuum X-ray generation from W film on Cu substrate

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 3 A, 2000, Pages 1418-1425

  Obori, Kenichi ^a   Yurugi, Toshikazu ^a   Ding, Ze Jun ^b   Nagatomi, Takaharu ^c   Fujii, Kentarou ^c   Kimura, Yoshihide ^c   Shimizu, Ryuichi ^c  

^a HORIBA LTD   (Japan)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

Continuum X ray generation; Cu; Monte Carlo simulation; W; X ray source

Indexed keywords

COMPUTER SIMULATION; COPPER; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; MONTE CARLO METHODS; OPTIMIZATION; SUBSTRATES; TUNGSTEN; X RAY SPECTROSCOPY;

CONTINUUM X RAY GENERATION; TUNGSTEN FILM; X RAY SOURCE;

METALLIC FILMS;

EID: 0033732948     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.1418     Document Type: Article

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