메뉴 건너뛰기




Volumn 82, Issue 1, 2000, Pages 249-253

Low-temperature anodic bonding to silicon nitride

Author keywords

[No Author keywords available]

Indexed keywords

BOND STRENGTH (MATERIALS); DIES; GLASS BONDING; OXIDATION; PLASMA APPLICATIONS; SILICON NITRIDE; TENSILE TESTING;

EID: 0033732615     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(99)00372-6     Document Type: Article
Times cited : (34)

References (14)
  • 2
    • 0028406369 scopus 로고
    • New applications of r.f.-sputtered glass films as protection and bonding layers in silicon micromachining
    • Berenschot J., Gardeniers J., Lammerink T., Elwenspoek M. New applications of r.f.-sputtered glass films as protection and bonding layers in silicon micromachining. Sens. Actuators, A. 41-42:1994;338-343.
    • (1994) Sens. Actuators, a , vol.4142 , pp. 338-343
    • Berenschot, J.1    Gardeniers, J.2    Lammerink, T.3    Elwenspoek, M.4
  • 3
    • 0042441501 scopus 로고    scopus 로고
    • Silicon-to-silicon wafer bonding using evaporated glass
    • Weichel S., de Reus R., Lindahl M. Silicon-to-silicon wafer bonding using evaporated glass. Sens. Actuators, A. 70:1998;179-184.
    • (1998) Sens. Actuators, a , vol.70 , pp. 179-184
    • Weichel, S.1    De Reus, R.2    Lindahl, M.3
  • 8
    • 0043286543 scopus 로고    scopus 로고
    • Effect of silicon oxide, silicon nitride and polysilicon layers on the electrostatic pressure during anodic bonding
    • Plaza J.A., Esteve J., Lora-Tamayo E. Effect of silicon oxide, silicon nitride and polysilicon layers on the electrostatic pressure during anodic bonding. Sens. Actuators, A. 67:1998;181-184.
    • (1998) Sens. Actuators, a , vol.67 , pp. 181-184
    • Plaza, J.A.1    Esteve, J.2    Lora-Tamayo, E.3
  • 9
    • 0027611874 scopus 로고
    • Anodic bonding of silicon to silicon wafers coated with aluminium, silicon oxide, polysilicon or silicon nitride
    • Nese M., Hanneborg A. Anodic bonding of silicon to silicon wafers coated with aluminium, silicon oxide, polysilicon or silicon nitride. Sens. Actuators, A. 37-38:1993;61-67.
    • (1993) Sens. Actuators, a , vol.3738 , pp. 61-67
    • Nese, M.1    Hanneborg, A.2
  • 10
    • 0024754542 scopus 로고
    • Oxidation of plasma enhanced chemical vapour deposited silicon nitride and oxynitride films
    • Denisse C., Smulders H., Habraken F., Van der Weg W. Oxidation of plasma enhanced chemical vapour deposited silicon nitride and oxynitride films. Appl. Surf. Sci. 39:1989;25-32.
    • (1989) Appl. Surf. Sci. , vol.39 , pp. 25-32
    • Denisse, C.1    Smulders, H.2    Habraken, F.3    Van Der Weg, W.4
  • 11
    • 0015077820 scopus 로고
    • Conversion of silicon nitride into silicon dioxide through the influence of oxygen
    • Franz I., Landheinrich W. Conversion of silicon nitride into silicon dioxide through the influence of oxygen. Solid-State Electron. 14:1971;499-505.
    • (1971) Solid-State Electron. , vol.14 , pp. 499-505
    • Franz, I.1    Landheinrich, W.2
  • 12
    • 0029324259 scopus 로고
    • Physical and electrical characterisation of oxynitride films produced by plasma oxidation of deposited silicon nitride layers
    • Kennedy G., Taylor S., Eccleston W., Arnoldbik W., Habraken F. Physical and electrical characterisation of oxynitride films produced by plasma oxidation of deposited silicon nitride layers. Microelectron. Eng. 28:1995;141-144.
    • (1995) Microelectron. Eng. , vol.28 , pp. 141-144
    • Kennedy, G.1    Taylor, S.2    Eccleston, W.3    Arnoldbik, W.4    Habraken, F.5
  • 14
    • 0042284541 scopus 로고
    • Bonding of structured wafers
    • Proceedings of the Third International Symposium on Semiconductor Wafer Bonding: Physics and Applications
    • Baumann H., Mack S., Münzel H. Bonding of structured wafers. Proceedings of the Third International Symposium on Semiconductor Wafer Bonding: Physics and Applications Electrochemical Society Proceedings. 95-7:1995;471-487.
    • (1995) Electrochemical Society Proceedings , vol.957 , pp. 471-487
    • Baumann, H.1    Mack, S.2    Münzel, H.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.