Broad-band active channels induced by electron beam lithography in LiF films for waveguiding devices

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 764-770

  Montereali, R M ^a   Bigotta, S ^a   Piccinini, M ^a   Giammatteo, M ^b   Picozzi, P ^b   Santucci, S ^b  

^a ENEA   (Italy)

^b UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COLOR CENTERS; COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; EVAPORATION; GLASS; LASER APPLICATIONS; LITHIUM COMPOUNDS; MONTE CARLO METHODS; OPTICAL MICROSCOPY; PHOTOLUMINESCENCE;

CONFOCAL LIGHT SCANNING MICROSCOPE (CLSM); LITHIUM FLUORIDE;

OPTICAL WAVEGUIDES;

EID: 0033729350     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)01045-9     Document Type: Article

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