RF plasma selective etching of boron nitride films

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 609-613

  Werbowy, A ^a   Szmidt, J ^a   Sokolowska, A ^a   Mitura, S ^b  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DRY ETCHING; MASKS; METALLIZING; NANOSTRUCTURED MATERIALS; PLASMA ETCHING; SILICON;

REACTIVE PULSE PLASMA;

CUBIC BORON NITRIDE;

EID: 0033729068     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00207-1     Document Type: Article

References (9)

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